Ion Implantation
We provide Ion Beam implantation services for researchers using single, interlinked (2 different ion species simultaneously) or in-situ ion implanters (combined ion implantation, RBS and electron beam annealing).
We have specialised equipment to ion implant any solid material with elements and isotopes with experimental- and industrial-scale equipment available. Temperature range: -150 C to 1200 C.
We provided verification using ion beam analysis.
Ion Energy: 5-100 keV
Implantation Area: Typically 10mm
Ion Species:All major elements eg. H, He, C, N, O, Fe, Ne, Na, Mg, Si, P, S, Ar, Ca, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Y, Ba, Ta.
Applications: Nanoscience, advanced materials and polymers.
Project Example: